Technical Library

Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. In most cases, ALD reactions use two chemical precursors which react with a surface one at a time in a sequential, self-limiting manner. A thin film results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is their conformality and the fact that the amount of control provided by an ALD arrangement (where the reacting precursors are spatially separated) allows to obtain very thing deposited layers (as fine as ~0.1 Å per cycle). Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films, but are stable enough to be handled and safely delivered to the reaction chamber.

Aluminum-based ALD Materials

SKU Image Name
OMAL025 DIMETHYLISOPROPOXYALUMINUM

Antimony-based ALD Materials

SKU Image Name
OMAN080 TRIS(DIMETHYLAMINO)ANTIMONY

Cobalt-based ALD Materials

SKU Image Name
AKC240 COBALT(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
OMCO018 CYCLOPENTADIENYLCOBALT DICARBONYL
INCO030 COBALT CARBONYL
INCO032 COBALT TRICARBONYL NITROSYL

Copper-based ALD Materials

SKU Image Name
AKC260 COPPER(II) 2,4-PENTANEDIONATE
AKC253 COPPER(II) HEXAFLUORO-2,4-PENTANEDIONATE, dihydrate
AKC252.8 COPPER(I)/(II) HEXAFLUORO-2,4-PENTANEDIONATE - VINYLTRIMETHYLSILANE COMPLEX

Hafnium-based ALD Materials

SKU Image Name
OMHF083 HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE)
OMHF080 HAFNIUM DIMETHYLAMIDE
OMHF075 HAFNIUM DIETHYLAMIDE

Lanthanum-based ALD Materials

SKU Image Name
AKL435 LANTHANUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
SIL6464.0 LANTHANUM TRIS(HEXAMETHYLDISILAZIDE)

Lithium-based ALD Materials

SKU Image Name
AKL454 LITHIUM t-BUTOXIDE
SIL6467.0 LITHIUM HEXAMETHYLDISILAZIDE, 95%

Manganese-based ALD Materials

SKU Image Name
AKM546 MANGANESE(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE

Nickel-based ALD Materials

SKU Image Name
AKN580 NICKEL(II) 2,4-PENTANEDIONATE

Phosphorous-based ALD Materials

SKU Image Name
OMPH080 TRIOCTYLPHOSPHINE

Ruthenium-based ALD Materials

SKU Image Name
OMRU055 RUTHENOCENE
OMRU027 DIETHYLRUTHENOCENE

Selenium-based ALD Materials

SKU Image Name
SIB1871.0 BIS(TRIMETHYLSILYL)SELENIDE

Silicon-based ALD Materials

SKU Image Name
SIT8714.0 TRIS(DIMETHYLAMINO)SILANE
SID2795.0 DI(t-BUTYLAMINO)SILANE
SIH5905.0 HEXACHLORODISILANE
SID3368.0 DICHLOROSILANE
SIT8088.0 TRI-t-BUTOXYSILANOL
SIT8627.0 TRI-t-PENTOXYSILANOL, 97%
SIB1072.0 BIS(DIMETHYLAMINO)DIMETHYLSILANE
SIH5841.0 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRICHLOROSILANE
SIT7123.0 TETRAIODOSILANE
SID3520.0 DIIODOSILANE, 95%
SIH6110.0 1,1,1,3,3,3-HEXAMETHYLDISILAZANE, 98%
SIO6700.0 OCTAMETHYLCYCLOTETRASILOXANE, 98%
SIT7085.0 TETRACHLOROSILANE, 98%
SIT7546.0 1,1,3,3-TETRAMETHYLDISILOXANE, 98%
SIT7542.0 1,1,3,3-TETRAMETHYLDISILAZANE
SIT8709.6 TRISILANE
SIO6708.0 7-OCTENYLTRICHLOROSILANE, tech

Tantalum-based ALD Materials

SKU Image Name
OMTA075 TANTALUM PENTAKIS(DIMETHYLAMIDE)
AKT810 TANTALUM(V) ETHOXIDE
OMTA082 TRIS(DIETHYLAMINO)(t-BUTYLIMINO) TANTALUM
INTA075 TANTALUM PENTAFLUORIDE
OMTA082 TRIS(DIETHYLAMINO)(t-BUTYLIMINO) TANTALUM

Tellurium-based ALD Materials

SKU Image Name
SIB1873.0 BIS(TRIMETHYLSILYL)TELLURIDE

Tin-based ALD Materials

SKU Image Name
SNT7350 TETRAKIS(DIMETHYLAMINO)TIN
SNT7560 TETRAMETHYLTIN
SNB2000 n-BUTYLTRICHLOROTIN
SNT7294 TETRAKIS(DIETHYLAMINO)TIN, 95%

Titanium-based ALD Materials

SKU Image Name
INTI065 TITANIUM TETRACHLORIDE, 99%
OMTI080 TITANIUM TETRAKIS(DIMETHYLAMIDE), 99+%
AKT872 TITANIUM ISOPROPOXIDE
OMTI075 TITANIUM TETRAKIS(DIETHYLAMIDE), 99+%
OMTI083 TITANIUM TETRAKIS(ETHYLMETHYLAMIDE), 99+%
AKT880 TITANIUM METHOXIDE, 95%

Zinc-based ALD Materials

SKU Image Name
OMZN017 DIETHYLZINC, 95%

Zirconium-based ALD Materials

SKU Image Name
OMZR083 ZIRCONIUM TETRAKIS(ETHYLMETHYLAMIDE)
OMZR080 ZIRCONIUM TETRAKIS(DIMETHYLAMIDE)
SIZ9920.0 ZIRCONIUM TRIS(2,2,5,5-TETRAMETHYL-2,5-DISILAPYRROLIDINE)CHLORIDE, tech
AKZ965 ZIRCONIUM 2-METHYL-2-BUTOXIDE