Technical Library

Gelest is the industry leader in synthesis and manufacturing of precursors for CVD and ALD silicon nitride. Offering custom designed silicon precursors to provide critical advantages in CVD and ALD.

Precursor Features:

  • Gas or liquid state with high vapor pressure
  • High thermal stability and good chemical integrity
  • High reactivity with ability to undergo rapid and clean decomposition

Precursor Benefits:

  • Ensures accuracy and control in transport and delivery into the ALD or CVD processing chamber
  • Strong resiliency to breakdown during storage, transport, and delivery into the deposition reactor
  • Clean elimination of unwanted ligands and undesirable attachments lead to high purity SiN
  • Requires low activation energy in the presence of ammonia or nitrogen-hydrogen to yield pure SiN without the need for plasma activation

Industry Leader With Expert Capabilities

  • Vertically-integrated leader in synthesis, manufacturing and supply of precursors
  • High volume production with Ship-To-Control quality management
  • Precursors packaged in leak and spill-proof vessels tailored to clients specifications
  • A fully integrated on-site demonstration laboratory for proof of concept work and joint development projects with clients
  • In-house competencies provide critical data for functionality links between precursor structure, processing parameters and resulting film properties 1,2

1. Kaloyeros, A. et al ECS Journal of Solid State Science and Technology, 6(10) P691-P714 (2017)
2. Arkles, B. et al Solid State Technologies, January/February 2018, pg 22-24

Perhydridosilanes for ALD and CVD

SKU Image Name Molecular Weight Form Vapor_Pressure_1_mm Boiling Point (°C / mm Hg) Melting Point (°C) Density
SIS6950.4 SILANE, 7.0 - 7.5% in nitrogen 32.12 gas -- -112 -185° 0.680
SID4594.0 DISILANE, 99.9+% 62.22 gas -- -14.5 -132° 0.686
SIT8709.6 TRISILANE 92.32 liquid -- 52.9 -117° 0.7430
SIT7880.0 n-TETRASILANE 122.42 liquid -- 107 -85 to -95° 0.825
SII6463.4 ISOTETRASILANE 122.42 liquid -- 101° -99° 0.793
SIN6597.07 NEOPENTASILANE 152.52 liquid -- 132-134 -- 0.805

Hydridohalosilanes for ALD and CVD

SKU Image Name Molecular Weight Form Vapor_Pressure_1_mm Boiling Point (°C / mm Hg) Melting Point (°C) Density
SIC2414.0 CHLOROSILANE, 95% 66.56 gas -- -30.4 -118° 1.145
SID3368.0 DICHLOROSILANE 101.01 gas -- 8.3° -122° 1.22
SID3520.1 DIIODOSILANE, 99% 283.91 liquid -- NA -1° --
SIT8378.56 TRIIODOSILANE 409.81 liquid -- 94-95/12 -- 3.314

Halosilanes for ALD and CVD

SKU Image Name Molecular Weight Form Vapor_Pressure_1_mm Boiling Point (°C / mm Hg) Melting Point (°C) Density
SIT7085.1 TETRACHLOROSILANE, 99.99+% 169.90 liquid -- 57.6 -70° 1.481
SIH5905.1 HEXACHLORODISILANE, 99.9% 268.89 liquid -- 144-146 -1° 1.562
SIO6601.0 OCTACHLOROTRISILANE, 96% 367.88 liquid -- 213-215 -67° 1.61
SIT7050.0 TETRABROMOSILANE 347.70 liquid -- 154 2.772
SIT7123.0 TETRAIODOSILANE 535.70 solid -- 287-288 120-1° 4.198

Aminosilanes for CVD and ALD

SKU Image Name Molecular Weight Form Vapor_Pressure_1_mm Boiling Point (°C / mm Hg) Melting Point (°C) Density
SIT8715.8 TRISILYLAMINE 107.33 liquid -- 52 -106° 0.895
SIB1069.0 BIS(DIETHYLAMINO)SILANE 174.16 liquid -- 70/30 -- 0.804
SID2795.0 DI(t-BUTYLAMINO)SILANE 174.36 liquid -- 167 -- 0.816
SIT8714.0 TRIS(DIMETHYLAMINO)SILANE 161.32 liquid -- 145-148 -90° 0.838
SIT8715.82 TRIS(ISOPROPYLAMINO)SILANE 203.4 liquid 1 mm 185-186 -- 0.85
SIT7276.0 TETRAKIS(DIMETHYLAMINO)SILANE 204.39 liquid -- 74-75/19 16° 0.8851
SIT8384.2 1,3,5-TRIISOPROPYLCYCLOTRISILAZANE 261.59 liquid -- 67/1.6 -- 0.919
SIT7542.0 1,1,3,3-TETRAMETHYLDISILAZANE 133.34 liquid -- 99-100 -- 0.766