Technical Library

Volatile carbosilanes are: the preeminent precursors for

  • Silicon carbide films and buffer layers
  • SiCO:H films for low-k barrier layers and etch-stop
  • Carbon-doped (tensile-strained) silicon
  • Silicon carbonitride utilized in passivation of silicon-based photovoltaics
  • ALD promoted patterning and seed layers

By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures.

Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1 according to the following general structure:

Carbosilane Compounds

SKU Image Name
SIM6515.0 METHYLSILANE
SID4230.0 DIMETHYLSILANE
SID4595.0 1,3-DISILAPROPANE
SID4592.0 1,3-DISILABUTANE
SID4593.0 1,4-DISILABUTANE
SIT8709.3 1,3,5-TRISILACYCLOHEXANE
SIT8709.8 1,3,5-TRISILAPENTANE
SIT8715.9 TRIS(SILYLMETHYL)SILANE

Oligosilanes and polysilanes undergo conversion to carbosilanes at temperatures above 650 °C

Oligosilanes and Polysilanes

SKU Image Name
SIT7541.0 1,1,2,2-TETRAMETHYLDISILANE
SIT7580.0 2,2,3,3-TETRAMETHYLTETRASILANE, 95%
PSS-1M01 POLY(DIMETHYLSILANE)