Technical Library

A range of silica structures from 20 nm to 1 micron have been modified with silanes to reduce hydroxyl content allowing improved dispersion. Other versions have monolayers with isolated secondary amine functionality, providing controlled interactions with resins. Systems that maintain low levels of hydroxyls have improved electrical properties. Introduction of low levels of secondary amines impart improved mechanical properties particularly in high humidity environments.

Organosilane-Modified Silica Nanoparticles

Product CodeStructureNameSurface Area (m2/g Carbon Content (%)CommentsCAS
SIS6960.0silicon dioxide, amorphous fumed silica200--γc: 44
isoelectric point: 2.2
pH (4% aqueous slurry): 3.5-4.5
[112945-52-5]
TSCA
SIS6962.0silicon dioxide, amorphous hexamethyldisilazane-treated
(fumed silica, HMDZ-treated)
150-2003Approximate ratio (CH3)3Si/HO-Si:
2:1
[68909-20-6]
TSCA
SIS6962.1M30silicon dioxide, amorphous hexamethyldisilazane-treated
(fumed silica, HMDZ-treated)
150-2002-3Calculated ratio (CH3)3Si/HO-Si:
1:1
[68909-20-6]
TSCA
SIS6962.1N30silicon dioxide, amorphous cyclic azasilane/hexamethyldisilazane-treated
fumed silica, n-methylaminopropyl-functional
150-2004-7Calculated ratio CH3NHCH2CH2CH2Si/(CH3)3Si:HO-Si:
1:2:1
[68909-20-6]
TSCA

Gelest provides custom surface treatment services. We can handle a wide range of materials with special process considerations including: inert atmospheres, highly flammable and corrosive treatments, as well as thermal and vacuum drying. For more information about custom surface treatments or to get a quote, please contact Gelest Technical Services.